Semiconductor
Industry
Polarized Transmission
Inspection System
Nuvis 6842 utilizes transmitted polarized imaging (TPI) technology for stress measurement, enabling the detection of crystal defects within SiC wafers, such as threading dislocations, micropipes, and triangular defects. It also visualizes macroscopic stress distributions, providing critical insights for optimizing manufacturing processes.
Nuvis 6842 provides a reliable and cost-effective solution for crystal defect inspection. It features highly collimated, uniform, polarized, and incoherent LED illumination, delivering significant cost savings and an extended lifespan.
Equipped with Motorized X-Y stages and Super High-resolution & Large Format CCD Sensors, it delivers defect map with high thought.
Inspection Capability
